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Single-substrate Plasma CVD Systems CMD Series

Single-substrate Plasma CVD Systems

CMD Series

The CMD Series are single-substrate CVD systems for deposition of silicon oxide and nitride films using SiH4 or TEOS. A high-frequency (27.12 MHz) power supply enables high-quality film deposition.

features

  • Improvements in the reaction chamber structure and gas supply system enable long-term stable deposition rates for TEOS(SiO2) films.
  • Unit drive systems can operate at higher temperatures than conventional process temperatures, and a new vacuum transfer robot has been developed to enable a stable transfer system.
  • Use of a high-frequency (27.12 MHz) power supply creates high-density plasma, for a high deposition rate.
  • Individual substrates can easily be managed using parameters such as deposition conditions.
  • A heated reaction gas path enables evacuation of all equipment (up to discharging unit) in gas state. Elimination of piping traps reduces by-product adhesion and maintenance time.

Applications

  • Low-temperature P-Si, α-Si TFTs

specifications

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