ULVAC offers etching systems to meet every need for hard-to-etch materials, from those for new nonvolatile memory to compound semiconductors.
High-Density Plasma Etching System for R&D NE-550EX
Dry Etching Tool APIOS NE-950EX
A Batch System to Remove Native Oxide RISETM-300
Dry Etching System for R&D NLD-570
Dry Etching System for Opto-Devices, MEMS NLD-5700
Non-volatile Material Etching Tool ULHITETMNE-7800H
Dry Etching System for Production NE-5700/NE-7800
Combined deposition and etch modules' system Gemini-200,300
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