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High-Density PlasmaEtching System for R&D NE-550EX

High-Density PlasmaEtching System for R&D

NE-550EX

NE550EX is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies.

features

  • Equip with low-pressure, low-electron-temperature and high-density plasma source.
  • Supports wide range of process control from ion etching to radical etching.
  • Plasma density and uniformity can be controlled by optimizing magnetic field.
  • Simple configuration makes maintenance easy.

applications

  • Ultra-high frequency devices, optical devices (LEDs, LDs)
  • Next-generation non-volatile memory
  • Biochips and microfluid devices
  • Photonic crystals
  • Sensors, MEMS (micro-electromechanical systems)

specifications

ItemSpecification
System configurationR&D/prototype system with Load Lock function
Substrate sizeUp to 150 mm
Operating pressure (Pa)0.07 to 6.7
Uniformity within substrate/substrate to substrate surfaces±3% max.
Substrate temperature controlElectrostatic chuck
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