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Low-acceleration and High-density Ion Implanter SOPHI-30

Low-acceleration and High-density Ion Implanter

SOPHI-30

SOPHI-30, cluster type low-acceleration and high-density ion implanter, has no mass separator and supports thin wafers.

features

  • Cluster type
  • Thin wafer compatible.
  • No mass separator
    * Advantages:
    1) High throughput ion implanter with low acceleration and high density
    2) Half price as compared to conventional implanter
    3) 1/3 the footprint of conventional implanter

applications

  • Power device manufacturing process, IGBT
  • Wafer size: Up to 200mm